3Y-TZP/BN纳米复相陶瓷的显微组织及其性能Microstructures and properties of machiaable 3Y-ZrO_2/BN nanocomposites
李永利,张久兴,乔冠军,金志浩
摘要(Abstract):
利用化学包覆和热压烧结制备出晶界型3Y-TZP/BN纳米复相陶瓷,并与机械混合相同工艺热压烧结的微米复相陶瓷对比。结果表明:3Y-TZP/BN纳米复相陶瓷较对应的微米复相陶瓷保留了更多的t-ZrO2,并且形成精细均匀的显微组织;纳米h-BN第二相在基体中高度弥散,使引入的缺陷尺寸降低到100nm以下。这是造成材料能够获得优良力学性能的主要原因。在BN弥散相的体积分散达到20%时,3Y-ZrO2/BN纳米复相陶瓷保持了优异的强韧性,具有高质量的可加工性,并显示出类似塑性加工的特征。
关键词(KeyWords): 纳米复相陶瓷;氧化锆;氮化硼;增韧;可加工性
基金项目(Foundation):
作者(Author): 李永利,张久兴,乔冠军,金志浩
Email:
DOI: 10.14024/j.cnki.1004-244x.2005.05.005
参考文献(References):
- [1] Borden Michael R, Joel Askinazi. Improving sapphire window strength[C]. SPIE,1997,3060:246-249.
- [2] Regan Thomas M,Harris Daniel C, Stroud Rhonda M,et al. Compressive strengthening of sapphire by neutron irradiation [C]. SPIE,2001,4375:31-40.
- [3] Johnson Linda F, Moran Mark B. Compressive coatings for strengthened sapphire[C]. SPIE, 1999,3705:130-141.
- [4] Frederick Schmid. Effects of crystal orientation and temperature on the strength of sapphire[J]. JAM Ceram Soc, 1998.
- [5] Harris Daniel C. Overview of progress in strengthening sapphire at elevated temperature[C]. SPIE, 1999,3705:5-6.
- [6]邱春文,陈雄文,石旺舟,等.磁控反应溅射法低温制备氮化 硅薄膜[J].汕头大学学报,2003,18(2):35-39.
- [7] Li Wei-tang, McKenzie David R,McFall William D,et al. Effect of sputtering-gas pressure on properties of silicon nitride films produced by helicon plasma sputtering[J]. Thin Solid Films 2001, 384:46-52.
- [8]严一心,林鸿海.薄膜技术[M].北京:兵器工业出版社,1994.
- [9] Rille E, Huter M. Optical properties of Si3N4 thin films produced by reactive d.c.-magnetron sputtering[C]. SPIE, 1994,2253: 1338-1342.