薄膜应力造成基片弯曲变形的力学分析Mechanical analysis of substrate bending deformation caused by film stress
赵明炬;
摘要(Abstract):
针对平板力学理论结构进行分析,研究薄膜应力造成基片弯曲变形的数学结构与力学行为。推算出两者间精确解与Stoney公式比较,探讨两者推导机制差异,进一步分析Stoney公式误差原因。利用电脑软件ABAQUS建立合理模型来提供数值解,探讨数学模式的正确性。
关键词(KeyWords): 薄膜应力;基片弯曲;力学分析
基金项目(Foundation):
作者(Author): 赵明炬;
Email:
DOI: 10.14024/j.cnki.1004-244x.2014.03.002
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