磁控溅射离子镀基体偏压对类石墨碳膜组织形貌及性能的影响Effect of bias voltage on morphology and performance of magnetron sputter ion plating graphite-like carbon coatings
梁戈;郑彬娜;蒋百灵;李玉庆;
摘要(Abstract)：
采用非平衡磁控溅射离子镀技术在单晶硅衬底上沉积类石墨碳膜(GLC),研究基体负偏压对GLC膜的组织形貌及性能的影响。结果表明:基体偏压影响镀层表面形貌,-30V下的镀层表面为较小颗粒状组织;-65V下的镀层表面均匀致密,无明显颗粒组织;-90V下的镀层颗粒边界趋于明显;-120V下的出现大小不均匀的颗粒。沉积速率在-65V前保持平稳,-90V时下降为0.25!m·h-1。随偏压的增加,Ar元素含量先增加后降低。
关键词(KeyWords)： 非平衡磁控溅射;偏压;形貌;沉积速率
基金项目(Foundation): 国家“863”科技攻关项目(2005AA33H010)
作者(Author): 梁戈;郑彬娜;蒋百灵;李玉庆;
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